Radiation Properties from Laser Produced Plasma for EUV Lithography Application.
نویسندگان
چکیده
منابع مشابه
Radiation-Hydrodynamics, Spectral, and Atomic Physics Modeling of Laser-Produced Plasma EUV Lithography Light Sources
Tin, lithium, and xenon laser-produced plasmas are attractive candidates as light sources for extreme ultraviolet lithography (EUVL). Simulation of the dynamics and spectral properties of plasmas created in EUVL experiments plays a crucial role in analyzing and interpreting experimental measurements, and in optimizing the 13.5 nm radiation from the plasma source. Developing a good understanding...
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Extreme ultraviolet (EUV) lithography devices that use laser produced plasma (LPP), discharge produced plasma (DPP), and hybrid devices need to be optimized to achieve sufficient brightness with minimum debris generation to support the throughput requirements of High-Volume Manufacturing (HVM) lithography exposure tools with long lifetime. Source performance, debris mitigation, and reflector sy...
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Discharge produced plasma (DPP) devices have been proposed as a light source for EUV lithography. A key challenge for DPP is achieving sufficient brightness to support the throughput requirements of exposure tools for high-volume manufacturing lithography. To simulate the environment of the EUV source and optimize the output of the source, an integrated model is being developed to describe the ...
متن کاملNumerical Simulation of Laser-produced Plasma Devices for Euv Lithography Using the Heights Integrated Model
Laser-produced plasma (LPP) devices have been modeled as the light source for extreme ultraviolet (EUV) lithography. A key challenge for LPP is achieving sufficient brightness to support the throughput requirements of high-volume manufacturing. An integrated model (HEIGHTS) was applied to simulate the environment of EUV sources and optimize their output. The model includes plasma evolution and ...
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High average power EUV light source has been the “most critical” issue in the research and development of the EUV lithography system in one decade. EUV LLC and International Sematech significantly stimulated the global research community to work seriously to advance plasma technology in achieving the goal of the EUV source, required by the semiconductor industry. It is instructive to look into ...
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ژورنال
عنوان ژورنال: IEEJ Transactions on Fundamentals and Materials
سال: 1998
ISSN: 0385-4205,1347-5533
DOI: 10.1541/ieejfms1990.118.11_1197